Resources
Equipment | Specifications |
---|---|
UV-vis Specord 50 | Single-beam 190 nm - 1000 nm, liquid samples |
UV-vis Specord 210 Plus | Double-beam 190 nm - 1000 nm, liquid and solid samples |
Cary Eclipse | Photoluminescence and phosphorescence measurements, 190 nm – 1000 nm, liquid samples |
Horiba MacroRaman | 785 nm laser, 100 – 3400 cm-1 spectral range, liquid and solid samples |
Filmetrics F20 | Thin-film thickness measurement 10 ? – 10 mm |
Linari electrospinning machine | Fabrication of nanofibers |
BASi Epsilon E2 potentiostat | Electrochemical characterization |
Monowave 50 | Microwave synthetic reactor, max. pressure 20 bar, max. temperature 250 °C, 6 mL max. volume |
Furnace | Tube furnace, max. temperature 1400 °C |
Vacuum oven | Vacuum range 10 – 750 mmHg, max. temperature 200 °C |
Chemat spin coater | Two stages, stage I: speed 500 ? 2,500 rpm 2-18 seconds, stage II: speed 1,000 ? 8,000 rpm 3-60 seconds |
Cressington 108 auto sputter coater with thickness controller | Au and Pt targets |